NanoAdvanced 300

Our industial scale series for pilot line production. Engineered for scalability, precision, and reliability in industrial settings.

Specifications:

• Substrate size: Up to 12in. x 12 in.
• Substrate loading: Automatic wafer loading and processing available
• Process temperature: 25°C - 400°C
• Operating condition: Inert condition
• Modular features: Additional features available upon request

Ideal Applications: Large-area coatings for photovoltaics, electronics, and protective coatings.

100x Faster

Non-Vacuum

High Quality

Compact

NanoCompact Series

NanoCompact model is designed for rapid coating of oxide films on any flat substrates with ease

The NanoCompact model operates under non-vacuum conditions, reducing costs and time, while ensuring high-quality coatings. With a higher deposition rate and compact design, NanoCompact is perfect for a variety of applications, including passivation, buffer and transparent conducting layers, as well as encapsulations.